Rapid High Resolution Full-wafer Imaging with Patented ChemetriQ Surface Potential Difference Imaging Technology
Sub-monolayer Sensitivity to Organic and Metallic Contamination
High Resolution Patterned Charge Maps for Measurement of Process-induced Charging
Patterned, Bare and Blanket Wafer Support
0mm Edge Exclusion for NVD Edge Inspection
Q-Viewer™ for Scan-Once-Optimize-Many™ Scan Analysis
Industry-standard KLARF Output in Bare- and Patterned-Compatible Formats
Enhanced Positional Accuracy and Repeatability
Fully-automated and Fab-ready for 200mm/300mm Production Monitoring
Inspection Applications:
Contamination and Charging from Wet Cleans
Process-induced Charging in Cleans and Plasma Processes
Surface Preparation Nonuniformity Detection
Contamination and Charging from Post CMP Cleans
In-line Process and Tool Monitoring
Post Maintenance Quals
Edge Inspection
Bumped and Diced Wafer Contamination
Includes Installation & Training
1 Year Technical Support and Warranty Coverage
ChemetriQ® 5000
Series
Inspection System
Built using the technology as Qcept's flagship product, the ChemetriQ 5000, is a non-contact, non-destructive tool that is the next-generation NVD inspection system designed for patterned wafers.
