UCPSS 2010
September 19-22, 2010

Qcept is proud to be a major sponsor of the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, a world class forum on the topics of wafer cleaning, clean processing and related metrology.

SEMATECH Surface Preparation and Cleaning Conference
March 22-24, 2010

The SEMATECH Surface Preparation and Cleaning Conference (SPCC) is an annual event which brings together prominent researchers from the semiconductor industry and the university community to focus on the current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 22nm node and beyond.

Frontiers of Characterization and Metrology for Nanoelectronics
May 11-15, 2009
Qcept will be presenting during the poster session at this year's Frontiers of Characterization and Metrology for Nanoelectronics held in Albany, NY.   The paper, jointly authored with Soitec, is entitled "VOC & Metallic Contaminant Control For SOI Process Monitoring."

11th Annual SEMATECH Surface Preparation and Cleaning Conference 2009
March 23-25, 2009
Qcept was a Platinum Sponsor and exhibitor at the 11th annual SPCC and featured in the presentation and poster sessions.  The focus of the conference was on current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 32nm node and beyond. 

UCPSS 2008
9th International Symposium on
Ultra Cleans Processing of Semiconductor Surfaces

Bruges, Belgium
September 22-24, 2008
Qcept is a major sponsor and exhibitor at this year's symposium.  Visit us in Booth # C-6

SEMICON West 2008
Booth # 1047, South Hall
Moscone Center
San Francisco, CA
July 15-17, 2008
The global semiconductor industry's premier conference and technology exhibition - Qcept will showcase its ChemetriQ® 3000 Wafer Inspection System.
Visit us in Moscone's South Hall, Booth #1047

2008 SEMATECH Surface Preparation and Cleaning Conference
Austin, TX
March 31-April 2, 2008
Qcept was a Platinum Sponsor of the 10th annual SPCC and featured in the presentation and poster sessions.  The focus of the conference was on current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 32nm node and beyond.