 Our ChemetriQ® inspection systems enable fabs to improve yield by detecting
Non-Visual Defects (NVD), sub-monolayer metallic and organic contamination,
and other yield-killing surface non-uniformities that cannot be seen by optical
tools. Whether you’re in a high-volume, advanced fab, in pilot production, development or a research lab, there's a ChemetriQ tool that will enable you to improve yield and increase fab profitability.
SPCC 2013 Detection and Elimination of a Yield Critical Non-Visual Residue Defect at Gate Module Etch and Clean Process March 2013 October 2012 Electrochemical Induced Pitting Defects at Gate Oxide Patterning July 2012 Impact of Charge During Gate Oxide Patterning on Yield By Jungtae Park, Sungjin Cho, Jeffrey Hawthorne SPCC 2012 Resist Charge to Oxide Pitting October 2011 Semiconductor Manufacturing; & Design "Non-visual defect inspection gives fabs better eyes, new insights" by Katherine Derbyshire July 2011 Semicon West March 2011 ElectroIQ March 2011 FabTech "Tool Order: Two Leading IC Manufacturers Select Qcept's Non-Visual Defect Inspection System" by Mark Osborne February 2011 Solid State Technology
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SEMATECH Surface Preparation and Cleaning ConferenceApril 2-4, 2013The SEMATECH Surface Preparation and Cleaning Conference (SPCC) is an annual event which brings together prominent researchers from the semiconductor industry and the university community to focus on the current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 16nm node and beyond. Qcept is a co-sponsor of the SPCC. Samsung Electronics will be presenting a joint-presentation with Qcept on the benefits of non-visual defect (NVD) inspection. |
